International SINANO Workshop

“Epitaxy for Si nanoelectronics”

“6-7 July 2006, Aix en Provence (France), Congress Center”

Second announcement with timetable

Organized by:

Erich Kasper

(University of Stuttgart, Institut für Halbleitertechnik)

Isabelle Berbezier

(L2MP, Faculté des Sciences de St. Jérôme)

Klara Lyutovich

(University of Stuttgart, Institut für Halbleitertechnik)

in conjunction with International Conference Conference on Nano-Structures

Self-Assembling NANO SEA 2006 (2-6 July 2006)

Scope:

We will bring together experts in epitaxy techniques and microelectronics engineers to

discuss the needs and opportunities of Si nanoelectronics:

- Materials and equipment for epitaxy

- Novel strained-Si platforms for advanced CMOS

- In situ process control and ex situ characterisation techniques

- Epitaxial foundry supply: status and prospects

- Silicon-based heterostructures and self-organised nanostructures.

Abstracts:

One page in Word or PDF format, 1.5 spaced, Times New Roman 11 fonts

should be sent as attachments per e-mail: lyutovich@iht.uni-stuttgart.de

Deadline for the abstract submission: March, 31, 2006

Registration:

Please use the registration form: Registration.doc

Later registration is only possible on site (July, 6th). Late registration fee: 150€

Accomodation:

Please use the NANO SEA website for the hotel reservation: http://www.l2mp.fr/nanosea/accomodation.html

Later registration is only possible on site (July, 6th). Late registration fee: 150€

Contact:

Klara Lyutovich (lyutovich@iht.uni-stuttgart.de), Universität Stuttgart,

Institut für Halbleitertechnik, Pfaffenwaldring 47. 70569 Stuttgart, Germany

Phone: +49-711-685-68005; Fax: +49-711-685-68044